Unraveling the deposition mechanism in a-C:H thin-film growth: A molecular-dynamics study for the reaction behavior of C[sub 3] and C[sub 3]H radicals with a-C:H surfaces
4th Jan 2006, 18:37 GMT
E. Neyts, A. Bogaerts, and M. C. M. van de Sanden In this molecular-dynamics study, we present the simulated growth of thin a-C:H films using the Brenner [(Phys. Rev. B [bold 42], 9458 (1990)] potential. These simulations are relevant for the growth of thin films, grown using low-energy hydrocarbons. In this work, we investigate the reaction mechan ... [J. Appl. Phys. 99, 014902 (2006)] published Wed Jan 4, 2006.
Unraveling the deposition mechanism in a-C:H thin-film growth: A molecular-dynamics study for the reaction behavior of C[sub 3] and C[sub 3]H radicals with a-C:H surfaces related news:
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