Si[sub 1 - y]C[sub y] surface alloys used as self-patterned templates for the growth of Ge dots
15th Nov 2006, 00:07 GMT
L. Simon, D. Aubel, and L. Kubler The authors report on epitaxial growth and surface morphology of low C content Si[sub 1y]C[sub y] alloys deposited on Si(001) (molecular beam epitaxy method). In specific kinetic conditions these alloys grow by formation and propagation of step bunches (710 nm high). The authors demonstrate that el ... [Appl. Phys. Lett. 89, 203104 (2006)] published Tue Nov 14, 2006.
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